High Power Expanded Plasma Cleaners from Harrick Plasma

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Harrick Plasma for
High Power Expanded Plasma Cleaners

Description

The High Power Expanded Plasma Cleaner is a versatile instrument, suitable for etching organic thin films (10-100 nm) as well as surface activation and modification.

Features:
  • Large, tabletop unit
  • Adjustable RF power (Low, Medium, and High power settings)
  • Applies a maximum of 45W to the RF coil
  • Low RF power setting is equivalent to High RF power setting on PDC-001/PDC-002
  • Includes a 6" diameter x 6.5" length Pyrex chamber
  • Hinged door with viewing window
  • Active fan cooling
  • Integral switch for a vacuum pump
  • 1/8" NPT metering valve to qualitatively control gas flow and chamber pressure
  • 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting
  • Only requires a vacuum pump with a minimum pump speed of 1.4 m3/hr (0.83 ft3/min) and an ultimate total pressure of 200 mTorr (0.27 mbar) or less